Mechanism of metallic contamination on Si wafers

Proceedings, Annual Technical Meeting - Institute of Environmental Sciences

Volumn 1, Issue , 1993, Pages 460-465

  Derouin, Francois ^a   Aomi, Hideki ^a   Ohmi, Tadahiro ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CHEMICAL CLEANING; COPPER; FLUORESCENCE; HYDROFLUORIC ACID; HYDROGEN PEROXIDE; IMPURITIES; METALS; SEMICONDUCTING SILICON; SOLUTIONS; SURFACE TREATMENT; X RAY ANALYSIS;

CHLORINE TERMINATED SURFACES; HYDROGEN TERMINATED SURFACES; SILICON WAFERS;

CONTAMINATION;

EID: 0027876007     PISSN: 00739227     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (26)