Plasma surface interactions and surface properties for remote H-plasma cleaning of Si(100)

Materials Research Society Symposium Proceedings

Volumn 315, Issue , 1993, Pages 197-209

  Schneider, T P ^a   Cho, J ^a   Chen, Y L ^a   Maher, D M ^a   Nemanich, R J ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LEVELS; HYDROGEN; LOW TEMPERATURE OPERATIONS; MATHEMATICAL MODELS; MOLECULAR BEAM EPITAXY; ORDER DISORDER TRANSITIONS; OXIDES; PLASMA APPLICATIONS; PRESSURE EFFECTS; SURFACE CLEANING; SURFACE PROPERTIES; THERMAL EFFECTS;

ANGLE RESOLVED ULTRAVIOLET PHOTOEMISSION SPECTROSCOPY; ELEY RIDEAL ABSTRACTION; HYDROGEN PLASMA CLEANING; LOW ENERGY ELECTRON DIFFRACTION; PHYSISORBED WEAKLY BOUND STATE; PLASMA SURFACE INTERACTIONS; THERMALLY ACTIVATED DESORPTION;

SEMICONDUCTING SILICON;

EID: 0027872797     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (21)