New Phenomena Of Charge Damage In Plasma Etching: Heavy Damage Only Through Dense-Line Antenna

Japanese Journal of Applied Physics

Volumn 32, Issue 12 S, 1993, Pages 6109-6113

  Hashimoto, Koichi ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Antenna effect; Antenna shape; Charge damage; Damage mechanism; ECR plasma etching; Electron shading; Microloading effect; Nonuniformity

Indexed keywords

ANTENNAS; CMOS INTEGRATED CIRCUITS; CYCLOTRON RESONANCE; DEFECTS; ELECTRIC CHARGE; ELECTRON RESONANCE; MOSFET DEVICES; PHASE SHIFT; PHOTORESISTS; PLASMA APPLICATIONS; VOLTAGE MEASUREMENT;

ANTENNA EFFECT; ANTENNA SHAPE; CHARGE DAMAGE; DAMAGE MECHANISM; ELECTRON SHADING; MICROLOADING EFFECT; NONUNIFORMITY; PLASMA ETCHING;

ETCHING;

EID: 0027867586     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.32.6109     Document Type: Article

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