Transparent conducting p-type NiO thin films prepared by magnetron sputtering

Thin Solid Films

Volumn 236, Issue 1-2, 1993, Pages 27-31

  Sato, H ^a   Minami, T ^a   Takata, S ^a   Yamada, T ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE FILMS; DIODES; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; FABRICATION; MAGNETRONS; NICKEL COMPOUNDS; SEMICONDUCTOR MATERIALS; SPUTTER DEPOSITION; SUBSTRATES; THICK FILMS; THICKNESS MEASUREMENT;

CONDUCTIVE THIN FILMS; CURRENT RECTIFICATION; HOLE CONCENTRATION; MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE; THIN FILM PIN DIODES; TRANSMITTANCE; VOLTAGE RECTIFICATION;

THIN FILMS;

EID: 0027866818     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(93)90636-4     Document Type: Article

References (15)

1. Highly Conductive and Transparent Aluminum Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering
2. Visible-Light Injection-Electroluminescent a-SiC/p-i-n Diode
3. Three new superconducting members of the family of tetramethyltetraselenafulvalene (TMTSF) salts: TMTSF2CIO4, TMTSF2SbF6, TMTSF2TaF6
4. Sintering of LixMi1?xO solid solutions at 1200�C
5. As-sputtered electrochromic films of nickel oxide
6. Electrochromic Behavior of Nickel Oxide Electrodes