|
Volumn , Issue , 1993, Pages 67-70
|
9.4-μm2 38-GHz sidewall polycide base bipolar (SPOTEC) with a half-micron CMOS technology for very-high-speed ULSIs
a a a a a a
a
HITACHI LTD
(Japan)
|
Author keywords
[No Author keywords available]
|
Indexed keywords
BIPOLAR TRANSISTORS;
CMOS INTEGRATED CIRCUITS;
ELECTRIC PROPERTIES;
EMITTER COUPLED LOGIC CIRCUITS;
FIELD EFFECT SEMICONDUCTOR DEVICES;
MOSFET DEVICES;
SEMICONDUCTOR DEVICE STRUCTURES;
SEMICONDUCTOR JUNCTIONS;
SIDEWALL POLYCIDE BASE BIPOLAR TECHNOLOGY;
ULSI CIRCUITS;
|
EID: 0027831979
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (3)
|
References (7)
|