Thin CVD Stacked Gate Dielectric for ULSI Technology

Technical Digest - International Electron Devices Meeting, IEDM

Volumn , Issue , 1993, Pages 321-324

  Tseng, Hsing Huang ^a   Tobin, Philip J ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEGRADATION; DIELECTRIC MATERIALS; GATES (TRANSISTOR); ULSI CIRCUITS;

STACKED GATE DIELECTRICS; SUB HALF MICRON REGIME; SUSCEPTIBILITY;

CHEMICAL VAPOR DEPOSITION;

EID: 0027814114     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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