Boron Diffusion Through Pure Silicon Oxide and Oxynitride Used for Metal-Oxide-Semiconductor Devices

Journal of the Electrochemical Society

Volumn 140, Issue 12, 1993, Pages 3624-3627

  Aoyama, Takayuki ^a   Suzuki, Kunihiro ^a   Tashiro, Hiroko ^a   Toda, Yoko ^a   Yamazaki, Tatsuya ^a   Arimoto, Yoshihiro ^a   Ito, Takashi ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; DIFFUSION; MATHEMATICAL MODELS; SILICON COMPOUNDS; SPECTROSCOPY;

CRITICAL TIME MODEL; OXYNITRIDE; SECONDARY ION MASS SPECTROSCOPY; SILICON OXIDE;

MOS DEVICES;

EID: 0027753412     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2221138     Document Type: Article

References (15)

1. J. R. Pfiester, L. C. Parrollo, and F. K. Baker, IEEE Electron Dev. Lett., 11, 247 (1990).
2. T. Morimoto, H. S. Momose, Y. Ozawa, K. Yamabe, and H. Iwai, IEDM Tech. Dig., p. 429 (1990).
3. H. S. Momose, T. Morimoto, Y. Ozawa, M. Tsutchiaki, M. Ono, K. Yamabe, and H. Iwai, IEDM Tech. Dig., p. 359 (1991).
4. A. Uchiyama, H. Fukuda, T. Hayashi, T. Iwabuchi, and S. Ohno, IEDM Tech. Dig., 425 (1990).
5. J. M. Sung, G. Y. Lu, M. L. Chen, and C. J. Hillenius, IEDM Tech. Dig., p. 447 (1989).
6. F. K. Baker, J. R. Pfiester, T. C. Mele, H. Tseng, P. J. Tobin, J. D. Hayden, C. D. Gunderson, and L. C. Parrillo, IEDM Tech. Dig., p. 443 (1989).
7. T. Ito, H. Arakawa, T. Nozaki, and H. Ishikawa, Journal of the Electrochemical Society, 127, 2248 (1980).
8. T. Ito, T. Nakamura, and H. Ishikawa, IEEE Trans. Electron Dev., ED-29, 498 (1982).
9. M. L. Naiman, F. L. Terry, J. A. Burns, J. I. Raffel, and R. Aucoin, IEDM Tech. Dig., p. 562 (1989).
10. W. Kern, RCA Review, 207 (1970).
11. M. E. Law, C. S. Rafferty, and R. W. Dutton, Stanford Electronics Laboratories Technical Reports, Stanford University (1988).
12. M. Ghezzo and D. M. Brown, Journal of the Electrochemical Society, 120, 146 (1973).
13. J. C. C. Tsai, VLSI Technology, S. M. Sze, Editor, Chapter 7, McGraw-Hill, New York (1988).
14. C. T. Sah, H. Sello, and D. A. Tremere, J. Phys. Chem. Solids, 11, 228 (1959).
15. D. A. Antoniadis, A. G. Gonzalez, and R. W. Dutton, Journal of the Electrochemical Society, 125, 813 (1978).