Diamond grain growth on cu substrate

Japanese Journal of Applied Physics

Volumn 32, Issue 11 B, 1993, Pages L1681-L1683

  Ojika, Shin Ichi ^a   Yamashita, Satoshi ^a   Kataoka, Kazuhiro ^a   Ishikura, Takefumi ^a  

^a Tokyo Reinetsu Sangyo Co Ltd ^*  (Japan)

Author keywords

Copper; Crystal growth; CVD; Diamond; ECR plasma; Grain growth; Surface energy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHEMICAL VARIABLES CONTROL; COPPER; CRYSTAL GROWTH; CYCLOTRON RESONANCE; ELECTRON RESONANCE; GRAIN GROWTH; GRAIN SIZE AND SHAPE; INTERFACIAL ENERGY; MORPHOLOGY; PLASMA APPLICATIONS; SUBSTRATES;

ELECTRON CYCLOTRON RESONANCE PLASMA;

DIAMONDS;

EID: 0027699220     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.32.L1681     Document Type: Article

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