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Volumn 14, Issue 10, 1993, Pages 484-486

Observation of Velocity Overshoot in Silicon Inversion Layers

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON VELOCITY ANALYZERS; GATES (TRANSISTOR); MATHEMATICAL MODELS; MONTE CARLO METHODS; NUMERICAL ANALYSIS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE STRUCTURES; SEMICONDUCTOR DEVICE TESTING; SILICON ON INSULATOR TECHNOLOGY; THERMAL EFFECTS;

EID: 0027678066     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/55.244738     Document Type: Article
Times cited : (39)

References (8)
  • 1
    • 35949009958 scopus 로고
    • Monte Carlo analysis of electron transport in small semiconductor devices including band-structure and space-charge effects
    • M. Fischetti and S. Laux, “Monte Carlo analysis of electron transport in small semiconductor devices including band-structure and space-charge effects,” Phys. Rev. B, vol. 38, pp. 9721–9745, 1988.
    • (1988) Phys. Rev. B , vol.38 , pp. 9721-9745
    • Fischetti, M.1    Laux, S.2
  • 2
    • 0022044296 scopus 로고
    • An investigation of steady-state velocity overshoot in silicon
    • Baccarani and M. Wordeman, “An investigation of steady-state velocity overshoot in silicon,” Solid-State Electron., vol. 28, pp. 407–416, 1985.
    • (1985) Solid-State Electron. , vol.28 , pp. 407-416
    • Baccarani, B.1    Wordeman, M.2
  • 3
    • 0024073264 scopus 로고
    • High transconductance and velocity overshoot in NOMS devices at the 0.1-μm gate-length level
    • G. Sai-Halasz, M. Wordeman, D. Kern, S. Rishton, and E. Ganin, “High transconductance and velocity overshoot in NOMS devices at the 0.1-μm gate-length level,” IEEE Electron Device Lett., vol. 9, pp. 464–466, 1988.
    • (1988) IEEE Electron Device Lett. , vol.9 , pp. 464-466
    • Sai-Halasz, G.1    Wordeman, M.2    Kern, D.3    Rishton, S.4    Ganin, E.5
  • 4
    • 0024070809 scopus 로고
    • Monte Carlo simulation of submicrometer Si n-MOSFET’s at 77 and 300K
    • S. Laux and M. Fischetti, “Monte Carlo simulation of submicrometer Si n-MOSFET’s at 77 and 300K,” IEEE Electron Device Lett., vol. 9, pp. 467–469, 1988.
    • (1988) IEEE Electron Device Lett. , vol.9 , pp. 467-469
    • Laux, S.1    Fischetti, M.2
  • 5
    • 0010377938 scopus 로고
    • Measurement of electron and hole saturation velocities in silicon inversion layers using SOI MOSFETs
    • F. Assaderaghi, J. Chen, P. Ko, and C. Hu, “Measurement of electron and hole saturation velocities in silicon inversion layers using SOI MOSFETs,” in IEEE Int. SOI Conf. Proc., 1992, pp. 112–113.
    • (1992) IEEE Int. SOI Conf. Proc. , pp. 112-113
    • Assaderaghi, F.1    Chen, J.2    Ko, P.3    Hu, C.4
  • 7
    • 0014749359 scopus 로고
    • Hot electron effects and saturation velocities in silicon inversion layers
    • F. F. Fang and A. B. Fowler, “Hot electron effects and saturation velocities in silicon inversion layers,” J. Appl. Phys., vol. 41, pp. 1825–1831, 1970.
    • (1970) J. Appl. Phys. , vol.41 , pp. 1825-1831
    • Fang, F.F.1    Fowler, A.B.2
  • 8
    • 0019003692 scopus 로고
    • Relation of drift velocity to low-field mobility and high-field saturation velocity
    • K. K. Thomber, “Relation of drift velocity to low-field mobility and high-field saturation velocity,” J. Appl. Phys., vol. 51, pp. 2127–2136, 1980.
    • (1980) J. Appl. Phys. , vol.51 , pp. 2127-2136
    • Thomber, K.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.