Long-term stability of a mo/si multilayer structure

Applied Optics

Volumn 32, Issue 25, 1993, Pages 4852-4854

  Barbee, T W ^a   Seely, J F ^b   Rife, J C ^b   Hunter, W R ^c   Kowalski, M P ^b   Cruddace, R G ^b  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

^c SFA INC   (United States)

Author keywords

Absolute responsivity; Extreme ultraviolet; Multilayers; Silicon photodiode; Thin film interference coatings

Indexed keywords

FILM PREPARATION; INTERFACES (MATERIALS); REFLECTION; SYNCHROTRON RADIATION; MOLYBDENUM; OPTICAL COATINGS; SILICON; THIN FILMS;

EXTREME ULTRAVIOLET; LONG TERM STABILITY; MATERIAL LAYERS; MO/SI MULTILAYER; NORMAL INCIDENCE; THIN FILM INTERFERENCE COATINGS;

MULTILAYERS; LIGHT REFLECTION;

EXTREME ULTRAVIOLET; MULTILAYERS;

EID: 0027653725     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.32.004852     Document Type: Article

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