Broad-Area Photodectrochemical Etching of n-Type Beta-SiC

Journal of the Electrochemical Society

Volumn 140, Issue 8, 1993, Pages L123-L125

  Shor, Joseph S ^a   Osgood, Richard M ^b  

^a Kulite Semiconductor Products Inc   (United States)

^b Och Spine at New York Presbyterian Hospitals   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; ETCHING; MASKS; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING; ULTRAVIOLET LAMPS; WSI CIRCUITS;

BETA SILICON CARBIDE; PHOTOELECTROCHEMICAL ETCHING;

SILICON CARBIDE;

EID: 0027641129     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2220722     Document Type: Article

References (9)

1. Silicon Carbide-1973 R. C. Marshall, J. W. Faust, and C. E. Ryan, Editors, University of South Carolina Press, Columbia, SC (1974).
2. J. W. Palmour, R. F. Davis, P. Astell-Burt, and P. Blackborow in Science and Technology of Microfabrication, R. E. Howard, E. L. Hu, S. Namba, and S. W. Pang, Editors, p. 185, (Materials Research Society, Pittsburgh, PA (1987).
3. J. S. Shor, X. G. Zhang, and R. M. Osgood, Journal of the Electrochemical Society, 139, 1213 (1992).
4. J. S. Shor, R. M. Osgood, and A. D. Kurtz, Appl. Phys. Lett., 60, 1001 (1992).
5. J. A. Powell, L. G. Matus, and M. A. Kuczmarski, Journal of the Electrochemical Society, 134, 1558 (1987).
6. P. Pirouz, C. M. Chorey, T. T. Cheng, and J. A. Powell, in Mat. Res. Soc. Symp. Proc., 91, 399 (1987).
7. T. H. Nguyen, M. M. Carrabba, T. D. Plante, and R. D. Rauh, Abstract 294, p. 474, The Electrochemical Society Extended Abstracts, Vol. 92–101, St. Louis, MO, May 17–22, 1992.
8. Iver Lauermann, D. Meissner, R. Memming, R. Reineke, and B. Kastening, Dechema-Monographien Band 124, p. 617 VCH Verlagsgesellshaft, (1991).
9. K. C. Lee, Journal of the Electrochemical Society, 137, 2556 (1991).