SCOPUS 정보 검색 플랫폼

Semiconductor Science and Technology

Volumn 8, Issue 7, 1993, Pages 1426-1433

A review of the plasma oxidation of silicon and its applications

(3) Taylor, S a Zhang, J F a Eccleston, W a

a UNIVERSITY OF LIVERPOOL (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA OXIDATION; SILICON DIOXIDE FILM;

OXIDATION; PHYSICAL PROPERTIES; PLASMA APPLICATIONS; SEMICONDUCTING FILMS; SEMICONDUCTOR GROWTH;

SEMICONDUCTING SILICON;

EID: 0027627831 PISSN: 02681242 EISSN: None Source Type: Journal
DOI: 10.1088/0268-1242/8/7/037 Document Type: Article

Times cited : (51)

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