A Novel Metal-Insulator-Metal Structure for Field-Programmable Devices

IEEE Transactions on Electron Devices

Volumn 40, Issue 7, 1993, Pages 1277-1283

  Cohen, Simon S ^a   Soares, Antonio M ^a   Gleason, Edward F ^a   Wyatt, Peter W ^a   Raffel, Jack I ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; CHEMICAL VAPOR DEPOSITION; ELECTRODES; INTEGRATED CIRCUIT MANUFACTURE; PLASMAS; SEMICONDUCTOR INSULATOR BOUNDARIES;

FIELD-PROGRAMMABLE GATE ARRAYS; VOLTAGE-PROGRAMMABLE LINK;

MIM DEVICES;

EID: 0027624772     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.216433     Document Type: Article

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