Formation of SiO2 on Contact Surface and Its Effect on Contact Reliability

IEEE Transactions on Components, Hybrids, and Manufacturing Technology

Volumn 16, Issue 4, 1993, Pages 437-441

  Tamai, Terutaka ^a  

^a HYOGO UNIVERSITY OF TEACHER EDUCATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEGRADATION; DEPOSITION; ELLIPSOMETRY; FAILURE (MECHANICAL); FILM GROWTH; MOLECULAR WEIGHT; PYROLYSIS; SILICA; SILICONES; SPECTROMETRY; SURFACES; THERMAL EFFECTS;

ELECTRICAL CONTACT FAILURE; SILICONE CONTAMINATION; SILICONE VAPOR; STATIC CONTACT RESISTANCE; X RAY DIFFRACTOMETRY (XRD); X RAY PHOTOELECTRON SPECTROMETRY (XPS);

ELECTRIC CONTACTS;

EID: 0027617354     PISSN: 01486411     EISSN: None     Source Type: Journal    
DOI: 10.1109/33.237940     Document Type: Article

References (9)

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2. M. Ishino and S. Mitani, “On contact failure caused by silicones and accelerated life test method,” in Proc. Holm Seminar on Electrical Contact Phenomena, 1977, pp. 207–212.
3. G. J. Witter and Leiper, “A comparison for the effects of various forms of silicon contamination on contact performance,” IEEE Trans. Comp., Hybrids, Manuf. Technol., vol. CHMT-2, pp. 56–61, 1979.
4. A. Eskes and H. A. Groenendijk, “The formation of insulation silicon compounds on switching contacts,” in Proc. IEEE Holm Conf. on Electrical Contacts, 1987, pp. 187–193.
5. R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarization. Amsterdam, The Netherlands: North-Holland, 1986.
6. T. Tamai, “Ellipsometric analysis for growth of Ag2S film and effect of oil film on corrosion resistance of Ag contact surface,” IEEE Trans. Comp., Hybrids, Manuf. Technol., vol. 12, pp. 43–47, 1989.
7. T. Tamai and M. Komonami, “Ellipsometric analysis for growth of contaminant films on contact surface,” IEICE, vol. E70, no. 4, pp. 343–345, 1987.
8. E. D. Palik, Handbook of Optical Constants of Solids. New York: Academic, 1985.
9. H. Ibach, ed., Electron Spectroscopy for Surface Analysis. New York: Springer-Verlag, 1977.