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Thin Solid Films

Volumn 228, Issue 1-2, 1993, Pages 319-325

Modelling and computer simulation of ion-beam- and plasma-assisted film growth

(1) Möller, Wolfhard a

a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; COMPOSITION; COMPUTER SIMULATION; CUBIC BORON NITRIDE; DIFFUSION; ION BEAMS; MATHEMATICAL MODELS; PLASMA APPLICATIONS; REACTION KINETICS; THIN FILMS; TITANIUM;

BORON NITRIDE; ION BEAM ASSISTED DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TRIDYN COMPUTER CODE; TRIM COMPUTER CODE;

FILM GROWTH;

EID: 0027594792 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/0040-6090(93)90625-Y Document Type: Article

Times cited : (33)

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