Preparation and microstructure of reactively sputtered Ti1-xZrxN films

Thin Solid Films

Volumn 228, Issue 1-2, 1993, Pages 169-172

  Sakamoto, I ^a   Maruno, S ^a   Jin, P ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHARACTERIZATION; ELECTRON SPECTROSCOPY; MICROSTRUCTURE; NITRIDES; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; THIN FILMS; TITANIUM COMPOUNDS; X RAY ANALYSIS; ZIRCONIUM COMPOUNDS;

APPLIED SUBSTRATE BIAS; DIFFUSION BARRIERS; ELECTRON PROBE MICROANALYSIS; HIGH RESOLUTION FIELD EMISSION SCANNING ELECTRON MICROSCOPY; REACTIVE SPUTTERING; TITANIUM ZIRCONIUM NITRIDE; X RAY DIFFRACTION;

CERAMIC COATINGS;

EID: 0027594791     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(93)90590-L     Document Type: Article

References (9)

1. Deposition and characterization of ternary nitrides
2. Proc. Int. Conf. Diffusion in Materials