Low pressure RF discharge in electronegative gases for plasma processing

Journal of Nuclear Materials

Volumn 200, Issue 3, 1993, Pages 309-314

  Feoktistov, V A ^a   Lopaev, D V ^a   Klopovsky, K S ^a   Popov, A M ^a   Popovicheva, O B ^a   Rakhimov, A T ^a   Rakhimova, T V ^a  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; EMISSION SPECTROSCOPY; GASES; LUMINESCENCE; MATHEMATICAL MODELS; OXYGEN; PLASMAS; SPATIAL VARIABLES MEASUREMENT;

ELECTRON ENERGY DISTRIBUTION FUNCTION (EEDF); ELECTRONEGATIVE GASES; LOW PRESSURE RADIO FREQUENCY DISCHARGE; PLASMA PROCESSING;

ELECTRIC DISCHARGES;

EID: 0027594170     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3115(93)90301-E     Document Type: Article

References (12)

1. Monte-Carlo simulation of electron properties in rf parallel plate capacitively coupled discharges