Furnace N2O oxidation process for submicron MOSFET device applications

Solid State Electronics

Volumn 36, Issue 5, 1993, Pages 749-751

  Hwang, Hyunsang ^a   Hao, Ming yin ^a   Lee, Jack ^a   Mathews, Viju ^b   Fazan, Pierre C ^b   Dennison, Chuck ^b  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b MICRON TECHNOLOGY INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OXIDATION; RELIABILITY; SEMICONDUCTOR DEVICE MANUFACTURE; SERVICE LIFE;

MOBILITY; OXYNITRIDE GATE MOSFET; SUBMICRON MOSFET;

MOSFET DEVICES;

EID: 0027591756     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1101(93)90245-L     Document Type: Review

References (6)