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Volumn 228, Issue 1-2, 1993, Pages 280-284
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Reactivity between Ti and N2C2H2 mixed gas on Ti(C, N) film deposition by arc-like plasma-enhanced ion plating
a
b
Shinko Seiki Co Ltd
*
(Japan)
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Author keywords
[No Author keywords available]
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Indexed keywords
ACETYLENE;
CARBIDES;
CHEMICAL REACTIONS;
COMPOSITION EFFECTS;
DEPOSITION;
FILM GROWTH;
NITRIDES;
NITROGEN;
PLASMA APPLICATIONS;
REACTION KINETICS;
THERMAL EFFECTS;
TITANIUM CARBIDE;
TITANIUM COMPOUNDS;
ELECTRON PROBE MICROANALYSIS;
REACTIVE ION PLATING;
REACTIVITY;
TITANIUM NITRIDE;
CERAMIC COATINGS;
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EID: 0027589572
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/0040-6090(93)90616-W Document Type: Article |
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Times cited : (10)
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References (9)
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