Optical functions of silicon-germanium alloys determined using spectroscopic ellipsometry

Optical Materials

Volumn 2, Issue 2, 1993, Pages 105-117

  Jellison Jr , G E ^a   Haynes, T E ^a   Burke, H H ^b  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b Och Spine at New York Presbyterian Hospitals   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; GERMANIUM ALLOYS; OPTICAL PROPERTIES; REFRACTIVE INDEX; SILICON ALLOYS;

OPTICAL THICKNESS; SILICON GERMANIUM ALLOYS; SPECTROSCOPIC ELLIPSOMETRY; WAVELENGTH;

CRYSTALLINE MATERIALS;

EID: 0027575447     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-3467(93)90035-Y     Document Type: Article

References (25)

1. Physics and applications of Ge<inf>x</inf>Si<inf>1-x</inf>/Si strained-layer heterostructures
2. Optical properties of Ge-Si alloys and superlattices
3. SiGe alloys: growth, properties and applications
4. Infrared Absorption of Silicon Near the Lattice Edge
5. Temperature dependence of the optical spectra of Si, Ge, and Ge-Si alloys
6. Optical spectra of SixGe1−x alloys
7. High Precision Scanning Ellipsometer
8. Two-channel polarization modulation ellipsometer
9. Determination of the optical functions of transparent glasses by using spectroscopic ellipsometry
10. Oxidation of Strained Si-Ge Layers Grown by MBE
11. Diffusion versus oxidation rates in silicon-germanium alloys