메뉴 건너뛰기




Volumn 40, Issue 3, 1993, Pages 564-569

Generalized Mobility Law for Drain Current Modeling in Si MOS Transistors from Liquid Helium to Room Temperatures

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; MOS DEVICES; MOSFET DEVICES; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MODELS;

EID: 0027558466     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/16.199361     Document Type: Article
Times cited : (37)

References (11)
  • 3
    • 0024630071 scopus 로고
    • A method for MOSFET parameter extraction at very low temperature
    • G. Ghibaudo and F. Balestra, “A method for MOSFET parameter extraction at very low temperature,” Solid-State Electron., vol. 32, p. 221, 1989.
    • (1989) Solid-State Electron. , vol.32 , pp. 221
    • Ghibaudo, G.1    Balestra, F.2
  • 4
    • 4243067087 scopus 로고
    • Characterization and modeling of silicon metal-oxide-semiconductor transistors at liquid helium temperature. Influence of source-drain series resistances
    • I. M. Hafez, F. Balestra, and G. Ghibaudo, “Characterization and modeling of silicon metal-oxide-semiconductor transistors at liquid helium temperature. Influence of source-drain series resistances,” J. Appl. Phys., vol. 68, p. 3694, 1990.
    • (1990) J. Appl. Phys. , vol.68 , pp. 3694
    • Hafez, I.M.1    Balestra, F.2    Ghibaudo, G.3
  • 5
    • 0023998758 scopus 로고
    • A new method for the extraction of MOSFET parameters
    • G. Ghibaudo, “A new method for the extraction of MOSFET parameters,” Electron. Lett., vol. 24, p. 543, 1988.
    • (1988) Electron. Lett. , vol.24 , pp. 543
    • Ghibaudo, G.1
  • 6
    • 0025491995 scopus 로고
    • Modelling of electron mobility in silicon inversion and accumulation layers at liquid helium temperature
    • I. M. Hafez, A. Emrani, G. Ghibaudo, and F. Balestra, “Modelling of electron mobility in silicon inversion and accumulation layers at liquid helium temperature,” Electron. Lett., vol. 26, p. 1633, 1990.
    • (1990) Electron. Lett. , vol.26 , pp. 1633
    • Hafez, I.M.1    Emrani, A.2    Ghibaudo, G.3    Balestra, F.4
  • 7
    • 0022717183 scopus 로고
    • An analytical model of conductance and transconductance for enhanced-mode MOSFETs
    • G. Ghibaudo, “An analytical model of conductance and transconductance for enhanced-mode MOSFETs,” Phys. Status Solidi (a), vol. 95, p. 323, 1986.
    • (1986) Phys. Status Solidi (a) , vol.95 , pp. 323
    • Ghibaudo, G.1
  • 8
    • 0025430936 scopus 로고
    • Measurements and modeling of the n-channel MOSFET inversion layer mobility and device characteristics in the temperature range 60–300 K
    • C.L. Huang and G. Gildenblat, “Measurements and modeling of the n-channel MOSFET inversion layer mobility and device characteristics in the temperature range 60–300 K,” IEEE Trans. Electron Devices, vol. 37, p. 1289, 1990.
    • (1990) IEEE Trans. Electron Devices , vol.37 , pp. 1289
    • Huang, C.L.1    Gildenblat, G.2
  • 9
    • 0025957008 scopus 로고
    • A comprehensive model for inversion layer hole mobility for simulation of sub micrometer MOSFET’s
    • V. M. Agostinelli, H. Shin, and A. F. Tasch, “A comprehensive model for inversion layer hole mobility for simulation of sub micrometer MOSFET’s,” IEEE Trans. Electron Devices, vol. 38, p. 151, 1991.
    • (1991) IEEE Trans. Electron Devices , vol.38 , pp. 151
    • Agostinelli, V.M.1    Shin, H.2    Tasch, A.F.3
  • 11
    • 0025484483 scopus 로고
    • Inversion layer mobility under high normal field in nitrided-oxide MOSFET’s
    • T. Hori, “Inversion layer mobility under high normal field in nitrided-oxide MOSFET’s,” IEEE Trans. Electron Devices, vol. 37, p. 2058, 1990.
    • (1990) IEEE Trans. Electron Devices , vol.37 , pp. 2058
    • Hori, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.