Plasma diagnostics of the high pressure oxygen-sputtering process

Thin Solid Films

Volumn 224, Issue 2, 1993, Pages 137-140

  Muralidhar, G K ^a   Mohan Rao, G ^a   Menon, A G ^a   Mohan, S ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; PLASMA APPLICATIONS; PLASMA DENSITY; PLASMA DIAGNOSTICS; PRESSURE EFFECTS; SUPERCONDUCTING FILMS; THERMAL EFFECTS; THIN FILMS; VAPOR DEPOSITION;

HIGH PRESSURE OXYGEN SPUTTERING PLASMA; LANGMUIR PROBE TECHNIQUE; YTTRIUM BARIUM COPPER OXIDE SUPERCONDUCTING THIN FILMS;

SPUTTER DEPOSITION;

EID: 0027553617     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(93)90423-M     Document Type: Article

References (19)

1. Charge transport in magnetrons