Needle-like crystallization of Ni doped amorphous silicon thin films

Solid State Communications

Volumn 85, Issue 11, 1993, Pages 921-924

  Hempel, T ^a   Schoenfeld, O ^a   Syrowatka, F ^b  

^a OTTO VON GUERICKE UNIVERSITY   (Germany)

^b MARTIN LUTHER UNIVERSITY HALLE WITTENBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CRYSTALLIZATION; CRYSTALS; DOPING (ADDITIVES); KINETIC THEORY; NICKEL; SEMICONDUCTING FILMS; SPUTTERING; THIN FILMS; ULTRAVIOLET SPECTROSCOPY;

AMORPHOUS SILICON; MONOCRYSTALLINE NETWORKS; NEEDLE-LIKE CRYSTALLIZATION; SILICON THIN FILMS;

SEMICONDUCTING SILICON;

EID: 0027553261     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1098(93)90704-Q     Document Type: Article

References (6)

1. Silicide precipitation and silicon crystallization in nickel implanted amorphous silicon thin films