-
1
-
-
84939365379
-
High density multichip interconnect for advanced packaging
-
Mar
-
J. J. H. Reche, “High density multichip interconnect for advanced packaging,” in Proc. NEPCON West, Mar. 1989, pp. 1308–1318.
-
(1989)
Proc. NEPCON West
, pp. 1308-1318
-
-
Reche, J.J.H.1
-
2
-
-
0025566479
-
Effects of polymer/metal interaction in thin-film multichip module applications
-
Dec.
-
G. M. Adema, I. Turlik, L.-T. Hwang, G. A. Rinne, and M. J. Berry, “Effects of polymer/metal interaction in thin-film multichip module applications,” IEEE Trans. Comp., Hybrids, Manuf. Technoi, vol. 13, no. 4, pp. 766–774, Dec. 1990.
-
(1990)
IEEE Trans. Comp., Hybrids, Manuf. Technoi
, vol.13
, Issue.4
, pp. 766-774
-
-
Adema, G.M.1
Turlik, I.2
Hwang, L.T.3
Rinne, G.A.4
Berry, M.J.5
-
3
-
-
0001262301
-
Polyimide on copper: The role of solvent in the formation of copper precipitates
-
Feb.
-
S. P. Kowalczyk, Y. H. Kim, G. F. Walker, and J. Kim, “Polyimide on copper: The role of solvent in the formation of copper precipitates,” Appl. Phys. Lett, vol. 52, no. 5, pp. 375–376, Feb. 1988.
-
(1988)
Appl. Phys. Lett
, vol.52
, Issue.5
, pp. 375-376
-
-
Kowalczyk, S.P.1
Kim, Y.H.2
Walker, G.F.3
Kim, J.4
-
4
-
-
84939362044
-
Studies on interaction of polyimide with copper in curing process
-
K. Miyazaki, O. Miura, and S. Numata, “Studies on interaction of polyimide with copper in curing process, “ in Proc. ECS Fall Meeting, 1988, pp. 296-297.
-
(1988)
Proc. ECS Fall Meeting
, pp. 296-297
-
-
Miyazaki, K.1
Miura, O.2
Numata, S.3
-
5
-
-
84947620776
-
Adhesion and interface investigation of polyimide on metals
-
Y.H. Kim, J. Kim, G. F. Wälder, C. Feger, and S. P. Kowalczyk, “Adhesion and interface investigation of polyimide on metals, “ J. Adhesion Sei. Technoi, vol. 2, no. 2, pp. 95-105, 1988.
-
(1988)
J. Adhesion Sei. Technoi
, vol.2
, Issue.2
, pp. 95-105
-
-
Kim, Y.H.1
Kim, J.2
Wälder, G.F.3
Feger, C.4
Kowalczyk, S.P.5
-
6
-
-
0001761790
-
Thin-film interdiffusions in Cu/Pd, Cu/Pt, Cu/Ni, Cu/NiB, Cu/Co, Cu/Cr, Cu/Ti, and Cu/TiN bilayer films: Correlations of sheet resistance with Rutherford backscattering spectrometries
-
Sept.
-
D.Y. Shih, C. A. Chang, J. Paraszczak, S. Nunes, and J. Cataldo, “Thin-film interdiffusions in Cu/Pd, Cu/Pt, Cu/Ni, Cu/NiB, Cu/Co, Cu/Cr, Cu/Ti, and Cu/TiN bilayer films: Correlations of sheet resistance with Rutherford backscattering spectrometries,” J. Appl. Phys., vol. 70, no. 6, pp. 3052–3060, Sept. 1991.
-
(1991)
J. Appl. Phys.
, vol.70
, Issue.6
, pp. 3052-3060
-
-
Shih, D.Y.1
Chang, C.A.2
Paraszczak, J.3
Nunes, S.4
Cataldo, J.5
-
7
-
-
0022603368
-
Diffusion barrier studies for Cu
-
C.K. Hu, S. Chang, M. B. Small, and J. E. Lewis, “Diffusion barrier studies for Cu,” in Proc. VLSI Multilevel Interconnection Conf., 1986, pp. 181–187.
-
(1986)
Proc. VLSI Multilevel Interconnection Conf.
, pp. 181-187
-
-
Hu, C.K.1
Chang, S.2
Small, M.B.3
Lewis, J.E.4
-
8
-
-
0021510506
-
An XPS and TEM study of intrinsic adhesion between polyimide and Cr films
-
Oct.
-
N. J. Chou, D. W. Dong, J. Kim, and A. C. Liu, “An XPS and TEM study of intrinsic adhesion between polyimide and Cr films,” J. Electrochem. Soc. : Solid-State Sci. Technoi., vol. 131, no. 10, pp. 2335–2340, Oct. 1984.
-
(1984)
J. Electrochem. Soc. : Solid-State Sci. Technoi.
, vol.131
, Issue.10
, pp. 2335-2340
-
-
Chou, N.J.1
Dong, D.W.2
Kim, J.3
Liu, A.C.4
-
9
-
-
84955044973
-
-
Nov./Dec.
-
L. J. Atanasoska, S. G. Anderson, H. M. Meyer III, Z. Lin, and J. H. Weaver, 7. Vac. Sci. Technoi, vol. 5, no. 6, pp. 3325–3333, Nov./Dec. 1987.
-
(1987)
Vac. Sci. Technoi
, vol.5
, Issue.6
, pp. 3325-3333
-
-
Atanasoska, L.J.1
Anderson, S.G.2
Meyer, H.M.3
Lin, Z.4
Weaver, J.H.5
-
10
-
-
84957275169
-
Metal polyimide interface: A titanium reaction mechanism
-
May/June
-
F. S. Ohuchi and S. C. Freilich, “Metal polyimide interface: A titanium reaction mechanism,” J. Vac. Sci. Technoi., vol. 4, no. 3, pp. 1039–1045, May/June 1986.
-
(1986)
J. Vac. Sci. Technoi.
, vol.4
, Issue.3
, pp. 1039-1045
-
-
Ohuchi, F.S.1
Freilich, S.C.2
-
11
-
-
84918473489
-
Interfacial reaction during metallization of cured polyimide: An XPS study
-
N. J. Chou and C. H. Tang, “Interfacial reaction during metallization of cured polyimide: An XPS study,” J. Vac. Sci. Technoi., vol. 2, no. 2, pp. 751–755, 1984.
-
(1984)
J. Vac. Sci. Technoi.
, vol.2
, Issue.2
, pp. 751-755
-
-
Chou, N.J.1
Tang, C.H.2
-
12
-
-
84941481279
-
Measurement of high-speed signal propagation characteristics in thin-film interconnections
-
L.T. Hwang, G. M. Adema, G. A. Rinne, and I. Turlik, “Measurement of high-speed signal propagation characteristics in thin-film interconnections,” in Proc. Int. Electronics Packaging Conf., 1990, pp. 272–277.
-
(1990)
Proc. Int. Electronics Packaging Conf.
, pp. 272-277
-
-
Hwang, L.T.1
Adema, G.M.2
Rinne, G.A.3
Turlik, I.4
-
13
-
-
84939726784
-
High density multilevel copper—polyimide interconnects
-
S. Poon, J. T. Pan, T. C. Wang, and B. Nelson, “High density multilevel copper—polyimide interconnects,” in Proc. Nat. Electronic Packaging Conf., 1989, pp. 426–448.
-
(1989)
Proc. Nat. Electronic Packaging Conf.
, pp. 426-448
-
-
Poon, S.1
Pan, J.T.2
Wang, T.C.3
Nelson, B.4
-
14
-
-
0025721657
-
Advanced multichip module packaging and interconnect issues for GaAs signal processors operating above 1 GHz clock rates
-
B. Gilbert, R. Thompson, G. Fokken, W. McNeff, J. Prentice, D. Rowlands, A. Staniszewski, W. Walters, and S. Zahn, “Advanced multichip module packaging and interconnect issues for GaAs signal processors operating above 1 GHz clock rates,” in Proc. Int. Symp. Advances in Interconnection and Packaging, 1990, pp. 235–248.
-
(1990)
Proc. Int. Symp. Advances in Interconnection and Packaging
, pp. 235-248
-
-
Gilbert, B.1
Thompson, R.2
Fokken, G.3
McNeff, W.4
Prentice, J.5
Rowlands, D.6
Staniszewski, A.7
Walters, W.8
Zahn, S.9
-
17
-
-
84954064522
-
Thermal stability issues in copper based metallization
-
J. Li, Y. Shacham-Diamond, and J. W. Mayer, “Thermal stability issues in copper based metallization,” in Proc. VLSI Multilevel Interconnection Conf., 1991, pp. 153–159.
-
(1991)
Proc. VLSI Multilevel Interconnection Conf.
, pp. 153-159
-
-
Li, J.1
Shacham-Diamond, Y.2
Mayer, J.W.3
-
19
-
-
0022738306
-
Diffusion of metals in silicon dioxide
-
June
-
J. D. McBrayer, R. M. Swanson, and T. W. Sigmon, “Diffusion of metals in silicon dioxide,” J. Electrochem. Soc. : Solid-State Sci. Technoi, vol. 133, no. 6, pp. 1242–1246, June 1986.
-
(1986)
J. Electrochem. Soc. : Solid-State Sci. Technoi
, vol.133
, Issue.6
, pp. 1242-1246
-
-
McBrayer, J.D.1
Swanson, R.M.2
Sigmon, T.W.3
-
21
-
-
84941442440
-
Dielectric materials for use in thin-film multichip modules
-
Feb.
-
G. M. Adema, M. J. Berry, and I. Turlik, “Dielectric materials for use in thin-film multichip modules,” Electron. Packaging Production, vol. 32, no. 2, Feb. 1992.
-
(1992)
Electron. Packaging Production
, vol.32
, Issue.2
-
-
Adema, G.M.1
Berry, M.J.2
Turlik, I.3
-
22
-
-
84941428323
-
Advances in MCM fabrication with benzocyclobutene dielectric
-
R. H. Heistand II, R. DeVellis, T. A. Maniai, A. P. Kennedy, P. E. Garrou, T. M. Stokich, P. H. Townsend, G. M. Adema, M. J. Berry, and I. Turlik, “Advances in MCM fabrication with benzocyclobutene dielectric,” in Proc. Int. Symp. Microelectronics, 1991, pp. 96–100.
-
(1991)
Proc. Int. Symp. Microelectronics
, pp. 96-100
-
-
Heistand, R.H.1
DeVellis, R.2
Maniai, T.A.3
Kennedy, A.P.4
Garrou, P.E.5
Stokich, T.M.6
Townsend, P.H.7
Adema, G.M.8
Berry, M.J.9
Turlik, I.10
-
23
-
-
51249171186
-
High rate magnetron RIE of thick polyimide films for advanced computer applications
-
G. J. Dishon, S. M. Bobbio, T. G. Tessier, Y. S. Ho, and R. Jewett, “High rate magnetron RIE of thick polyimide films for advanced computer applications,” J. Electron. Mat., vol. 18, no. 2, 1989.
-
(1989)
J. Electron. Mat.
, vol.18
, Issue.2
-
-
Dishon, G.J.1
Bobbio, S.M.2
Tessier, T.G.3
Ho, Y.S.4
Jewett, R.5
-
24
-
-
0024168411
-
Image reversal and lift-off: A versatile combination for ULSI processing
-
S. K. Jones, R. C. Chapman, G. Dishon, and E. K. Pavelchek, “Image reversal and lift-off: A versatile combination for ULSI processing,” in Proc. Eighth Int. Tech. Conf. Photopolymers (SPE), 1988, pp. 279–291.
-
(1988)
Proc. Eighth Int. Tech. Conf. Photopolymers (SPE)
, pp. 279-291
-
-
Jones, S.K.1
Chapman, R.C.2
Dishon, G.3
Pavelchek, E.K.4
-
25
-
-
0022957210
-
TEM/STEM sample preparation for the investigation of solid-state structures: Applications to electronic devices and computer components
-
R. E. Flutie, “TEM/STEM sample preparation for the investigation of solid-state structures: Applications to electronic devices and computer components,” in Proc. Materials Res. Soc. Symp., 1986, pp. 105–112.
-
(1986)
Proc. Materials Res. Soc. Symp.
, pp. 105-112
-
-
Flutie, R.E.1
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