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Volumn 62, Issue 5, 1993, Pages 476-478
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Self-assembled monolayer electron beam resist on GaAs
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRON BEAM LITHOGRAPHY;
ETCHING;
MASKS;
ORGANIC COMPOUNDS;
PHOTORESISTS;
RADIATION EFFECTS;
SPECTROSCOPIC ANALYSIS;
THIN FILMS;
ELECTRON BEAM IRRADIATED FILMS;
GALLIUM ARSENIDE ETCHING MASKS;
N-OCTADECANETHIOL MONOLAYER RESISTS;
SELF-ASSEMBLED MONOLAYER FILMS;
SELF-DEVELOPING POSITIVE RESISTS;
THIN ETCH-RESISTANT LAYERS;
SEMICONDUCTING GALLIUM ARSENIDE;
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EID: 0027542025
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.108938 Document Type: Article |
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Times cited : (145)
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References (11)
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