SCREAM I: a single mask, single-crystal silicon process for microelectromechanical structures

IEEE Micro Electro Mechanical Systems

Volumn , Issue , 1993, Pages 155-160

  Shaw, Kevin A ^a   Zhang, Z Lisa ^a   MacDonald, Noel C ^a  

^a Department of Obstetrics Gynecology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICES;

MICROELECTROMECHANICAL (MEM) DEVICES; MICROELECTROMECHANICAL STRUCTURES; SCREAM 1; SINGLE CRYSTAL SILICON (SCS); SINGLE CRYSTAL SILICON REACTIVE ETCH AND METAL (SCREAM) PROCESS;

MICROELECTROMECHANICAL DEVICES;

EID: 0027283106     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)