Diamond doping by low energy ion implantation during growth

Materials Research Society Symposium Proceedings

Volumn 302, Issue , 1993, Pages 251-256

  Jamison, K D ^a   Schmidt, H K ^a   Eisenmann, D ^a   Hellmer, R P ^a  

^a SI Diamond Technology Inc ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTAL LATTICES; ION BEAMS; ION IMPLANTATION; PHOSPHORUS; RUBIDIUM; SEMICONDUCTOR DOPING; SEMICONDUCTOR GROWTH; SODIUM;

HOT FILAMENT CHEMICAL VAPOR DEPOSITION CHAMBER; LOW ENERGY ION IMPLANTATION;

SEMICONDUCTING DIAMONDS;

EID: 0027268911     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-302-251     Document Type: Conference Paper

References (16)