In situ monitoring and universal modelling of sacrificial PSG etching using hydrofluoric acid

IEEE Micro Electro Mechanical Systems

Volumn , Issue , 1993, Pages 71-76

  Liu, Jianqiang ^a   Tai, Yu Chong ^a   Lee, Jiajing ^a   Pong, Kim Cheok ^a   Zohar, Yitshak ^a   Ho, Chih Ming ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; HYDROFLUORIC ACID;

PSG ETCHING; PSG MICROCHANNEL ETCHING;

ELECTROMECHANICAL DEVICES;

EID: 0027202853     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)