Correlation between negative bulk oxide charge and breakdown, modeling, and new criteria for dielectric quality evaluation

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 1993, Pages 280-284

  Monserie, C ^a   Papadas, C ^a   Ghibaudo, G ^a   Gounelle, C ^a   Mortini, P ^a   Pananakakis, G ^a  

^a STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE;

GATE OXIDE TECHNOLOGIES;

CMOS INTEGRATED CIRCUITS;

EID: 0027201226     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/relphy.1993.283287     Document Type: Conference Paper

References (20)