Thin TiO2 Films Prepared by Low Pressure Chemical Vapor Deposition

Journal of the Electrochemical Society

Volumn 140, Issue 1, 1993, Pages 145-149

  Rausch, N ^a   Burte, E P ^a  

^a Fraunhofer Arbeitsgruppe für Integrierte Schaltungen ^*  (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CAPACITORS; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; DIELECTRIC MATERIALS; ELECTRIC PROPERTIES; ELECTRONIC PROPERTIES; MIS DEVICES; ORGANOMETALLICS; PYROLYSIS; THIN FILMS; ULSI CIRCUITS;

ANATASE; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE STRUCTURE;

TITANIUM OXIDES;

EID: 0027187188     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2056076     Document Type: Article

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