Amorphous silicon carbide films by plasma-enhanced chemical vapor deposition

IEEE Micro Electro Mechanical Systems

Volumn , Issue , 1993, Pages 242-247

  Tong, Lijun ^a   Mehregany, Mehran ^a   Tang, William C ^a  

^a CASE WESTERN RESERVE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE; SILICON DIOXIDE;

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSTION; SURFACE MICROMACHINING PROCESSES;

METALLIC FILMS;

EID: 0027147272     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)