Evaluation of modern gate oxide technologies to process charging

Annual Proceedings - Reliability Physics (Symposium)

Volumn , Issue , 1993, Pages 255-261

  Crook, Dwight ^a   Domnitei, Mike ^a   Webb, Mark ^a   Bonini, John ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MEASUREMENTS; RELIABILITY; VLSI CIRCUITS;

GATE OXIDE TECHNOLOGIES;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0027146994     PISSN: 00999512     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/relphy.1993.283316     Document Type: Conference Paper

References (0)