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Volumn , Issue , 1992, Pages 87-92
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High aspect ratio electroplated microstructures using a photosensitive polyimide process
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NONE
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTROPLATING;
MICROMACHINING;
POLYIMIDES;
SEMICONDUCTOR DEVICE MANUFACTURE;
HIGH-ASPECT-RATIO MICROSTRUCTURES;
PHOTOSENSITIVE POLYIMIDES;
INTEGRATED CIRCUIT MANUFACTURE;
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EID: 0027099346
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/memsys.1992.187696 Document Type: Conference Paper |
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Times cited : (52)
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References (34)
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