Temporal evolution of silicon surface roughness during anisotropic etching processes

Volumn , Issue , 1992, Pages 62-66

  Findler, G ^a   Muchow, J ^a   Koch, M ^a   Munzel, H ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE;

ANISOTROPIC ETCHING; CHEMICAL WET ETCHING; SILICON PLANES; SILICON SURFACE ROUGHNESS;

INTEGRATED CIRCUIT MANUFACTURE;

EID: 0027040230     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/memsys.1992.187691     Document Type: Conference Paper

References (12)