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Volumn 31, Issue 12 R, 1992, Pages 4002-4009

Effects of nitrogen pressure and rf power on the properties of reactive magnetron sputtered zr-n films and an application to a thermistor

Author keywords

Reactive sputtering; RF sputtering; Thin film; Thin film thermistor; Zirconium nitride; ZrN

Indexed keywords

THERMISTORS; THIN FILMS;

REACTIVE SPUTTERING; THIN-FILM THERMISTORS; ZIRCONIUM NITRIDE FILM;

ZIRCONIUM COMPOUNDS;

EID: 0027005183 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.31.4002 Document Type: Article

Times cited : (31)

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