Dependence of Plasma-Induced Oxide Charging Current on Al Antenna Geometry

IEEE Electron Device Letters

Volumn 13, Issue 12, 1992, Pages 600-602

  Shin, Hyungcheol ^a   Hu, Chenming ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ANTENNAS; CAPACITORS; ELECTRIC CURRENT MEASUREMENT; ELECTRODES; PHOTORESISTS; PLASMAS;

ALUMINUM ANTENNA GEOMETRY; ALUMINUM ELECTRODE GEOMETRY; ELECTRODE EDGE LENGTH; PLASMA-INDUCED OXIDE CHARGING CURRENT; STRESS CURRENT;

MOS DEVICES;

EID: 0026993978     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/55.192857     Document Type: Article

References (10)

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9. H. Shin and C. Hu, to be published.
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