Deposition Characteristics of Metal Contaminants from HF-Based Process Solutions Onto Silicon Wafer Surfaces

Journal of the Electrochemical Society

Volumn 139, Issue 12, 1992, Pages 3659-3664

  Lowry, Robert K ^d   Craigin, Robert ^b  

^a INTEL CORPORATION   (United States)

^b UNIVERSITY OF ARIZONA   (United States)

^c Honeywell Incorporated Phoenix ^*  (United States)

^d National Center for Health Statistics   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; ELECTRIC PROPERTIES; HYDROFLUORIC ACID; IMPURITIES; INTEGRATED CIRCUIT MANUFACTURE; METALS; SURFACE TREATMENT; TRACE ELEMENTS;

CLEANING SOLUTIONS; METAL CONTAMINANTS; SILICON WAFERS;

SEMICONDUCTING SILICON;

EID: 0026992980     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2069139     Document Type: Article

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