Fabrication of homogenious poly-Si TFT's using excimer laser annealing

Conference on Solid State Devices and Materials

Volumn , Issue , 1992, Pages 55-57

  Asai, I ^a   Kato, N ^a   Fuse, M ^a   Hamano, T ^a  

^a FUJI XEROX CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; EXCIMER LASERS; SEMICONDUCTING SILICON;

POLYSILICON; THIN FILM TRANSISTORS;

TRANSISTORS;

EID: 0026963584     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)