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Volumn 35, Issue 12, 1992, Pages 1761-1770
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Simulation of ultra thin film SOI transistors using a non-local ballistic model for impact ionisation
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER SIMULATION;
IONIZATION;
SEMICONDUCTOR DEVICE MODELS;
SILICON ON INSULATOR TECHNOLOGY;
THIN FILM DEVICES;
BIPOLAR HOLDING VOLTAGE PREDICTION;
IMPACT IONIZATION;
LIGHTLY-DOPED DRAIN;
LIGHTLY-DOPED SOURCE;
NON-LOCAL BALLISTIC MODEL;
TWO-DIMENSIONAL DEVICE SIMULATOR;
ULTRA-THIN FILM SOI TRANSISTORS;
TRANSISTORS;
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EID: 0026959233
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/0038-1101(92)90258-E Document Type: Article |
Times cited : (6)
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References (25)
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