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Volumn 35, Issue 12, 1992, Pages 1761-1770

Simulation of ultra thin film SOI transistors using a non-local ballistic model for impact ionisation

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; IONIZATION; SEMICONDUCTOR DEVICE MODELS; SILICON ON INSULATOR TECHNOLOGY; THIN FILM DEVICES;

EID: 0026959233     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1101(92)90258-E     Document Type: Article
Times cited : (6)

References (25)
  • 14
    • 84916467549 scopus 로고    scopus 로고
    • D. Kimpton and J. Kerr, GPS Marconi, Lincoln, private communication
  • 15
    • 0024945944 scopus 로고
    • Characterization of negative resistance and bipolar latchup in thin film SOI transistors by two-dimensional numerical simulation
    • Nevada
    • (1989) Proc. IEEE SOS/SOI Tech. Conf. , pp. 44-45
    • Armstrong1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.