Metallic Impurities Segregation at the Interface Between Si Wafer and Liquid During Wet Cleaning

Journal of the Electrochemical Society

Volumn 139, Issue 11, 1992, Pages 3317-3335

  Ohmi, T ^a   Imaoka, T ^a   Sugiyama, I ^a   Kezuka, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; IMPURITIES; INTERFACES (MATERIALS); METALS; SEGREGATION (METALLOGRAPHY);

METALLIC IMPURITIES; SILICON WAFERS; WET CLEANING;

SEMICONDUCTING SILICON;

EID: 0026945022     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2069074     Document Type: Article

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