Compositional Analysis and Capacitance-Voltage Properties of TiO2 Films by Low Pressure Metal-Organic Chemical Vapor Deposition

Journal of the Electrochemical Society

Volumn 139, Issue 11, 1992, Pages 3284-3288

  Kim, Ho Gi ^b   Won, Tae Kyung ^b  

^a Chungnam National University   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; COATINGS; COMPOSITION EFFECTS; ELECTRIC PROPERTIES; ORGANOMETALLICS; SEMICONDUCTING SILICON; THIN FILMS;

CAPACITANCE-VOLTAGE PROPERTIES; COMPOSITIONAL ANALYSIS; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION;

TITANIUM OXIDES;

EID: 0026944440     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2069068     Document Type: Article

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