메뉴 건너뛰기




Volumn 13, Issue 10, 1992, Pages 525-527

InAlAs/InGaAs/InP MODFET's with Uniform Threshold Voltage Obtained by Selective Wet Gate Recess

Author keywords

[No Author keywords available]

Indexed keywords

FIELD EFFECT TRANSISTORS; HETEROJUNCTIONS; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0026940016     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/55.192822     Document Type: Article
Times cited : (36)

References (11)
  • 1
    • 0000125635 scopus 로고
    • Selective etching characteristics of peroxide/ammonium-hydroxide solutions for GaAs/Al0 16Ga084As
    • K. Kenefick, “Selective etching characteristics of peroxide/ammonium-hydroxide solutions for GaAs/Al 0 16 Ga 084 As,” J. Electrochem. Soc. Solid-State Sci. & Technol., vol. 129, pp. 2380–2382, 1982.
    • (1982) J. Electrochem. Soc. Solid-State Sci. & Technol. , vol.129 , pp. 2380-2382
    • Kenefick, K.1
  • 2
    • 0026765051 scopus 로고
    • A comparative study of wet and dry selective etching processes for GaAs/AlGaAs/InGaAs pseudomorphic MODFETs
    • M. Tong et al., “A comparative study of wet and dry selective etching processes for GaAs/AlGaAs/InGaAs pseudomorphic MODFETs,” J. Elect. Mater., vol. 21, pp. 9–15, 1992.
    • (1992) J. Elect. Mater. , vol.21 , pp. 9-15
    • Tong, M.1
  • 3
    • 0002631624 scopus 로고
    • Selective reactive ion etching of GaAs on AlGaAs using CC12f2 and He
    • A. Seabaugh, “Selective reactive ion etching of GaAs on AlGaAs using CC1 2 f2 and He,” J. Vac. Sci. Technol., vol. B6, pp. 77–81, 1988.
    • (1988) J. Vac. Sci. Technol. , vol.B6 , pp. 77-81
    • Seabaugh, A.1
  • 4
    • 0026852510 scopus 로고
    • Elimination of mesa-sidewall gate leakage in InAlAs/InGaAs heterostructures by selective sidewall recessing
    • S. R. Bahl and J. A. del Alamo, “Elimination of mesa-sidewall gate leakage in InAlAs/InGaAs heterostructures by selective sidewall recessing,” IEEE Electron Device Lett., vol. 13, pp. 195–197, 1992.
    • (1992) IEEE Electron Device Lett. , vol.13 , pp. 195-197
    • Bahl, S.R.1    del Alamo, J.A.2
  • 6
    • 0025431865 scopus 로고
    • Selectively dry-etched n+-GaAs/N-InAlAs/InGaAs HEMT's for LSI
    • S. Kuroda, N. Harada, S. Sasa, T. Mimura, and M. Abe, “Selectively dry-etched n + -GaAs/N-InAlAs/InGaAs HEMT's for LSI,” IEEE Electron Device Lett., vol. 11, pp. 230–232, 1990.
    • (1990) IEEE Electron Device Lett. , vol.11 , pp. 230-232
    • Kuroda, S.1    Harada, N.2    Sasa, S.3    Mimura, T.4    Abe, M.5
  • 7
    • 0026817486 scopus 로고
    • Highly uniform N-InAlAs/InGaAs HEMT's on a 3-in InP substrate using photochemical selective dry recess etching
    • S. Kuroda, K. Imanishi, N. Harada, K. Hikosaka, and M. Abe, “Highly uniform N-InAlAs/InGaAs HEMT's on a 3-in InP substrate using photochemical selective dry recess etching,” IEEE Electron Device Lett., vol. 13, pp. 105–107, 1992.
    • (1992) IEEE Electron Device Lett. , vol.13 , pp. 105-107
    • Kuroda, S.1    Imanishi, K.2    Harada, N.3    Hikosaka, K.4    Abe, M.5
  • 8
    • 0026204057 scopus 로고
    • 0.23 μm gate length MODFETs on InAlAs/ InGaAs/InP heterostructure grown by MOVPE
    • M. Tong et al., “0.23 μm gate length MODFETs on InAlAs/ InGaAs/InP heterostructure grown by MOVPE,” Electron. Lett., vol. 27, pp. 1426–1427, 1991.
    • (1991) Electron. Lett. , vol.27 , pp. 1426-1427
    • Tong, M.1
  • 11
    • 84941478326 scopus 로고    scopus 로고
    • OMVPE-grown InAlAs/InGaAs/InP MODFETs with performance comparable to those grown by MBE
    • M. Tong et al., “OMVPE-grown InAlAs/InGaAs/InP MODFETs with performance comparable to those grown by MBE,” to be published in IEEE Trans. Electron Devices.
    • to be published in IEEE Trans. Electron Devices
    • Tong, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.