Formation and properties of cubic boron nitride films on tungsten carbide by plasma chemical vapor deposition

Japanese Journal of Applied Physics

Volumn 31, Issue 10 R, 1992, Pages 3455-3460

  Okamoato, Masaki ^a   Utsumi, Yoshiharu ^a   Osaka, Yukio ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Buffer layer of boron (B) film; Cubic boron nitride; Infrared reflectance polarization spectra; Negative self bias; Transmission electron diffraction (TED); Transmission electron microscopy (TEM)

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILMS; PLASMA DEVICES; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN COMPOUNDS;

BORON NITRIDE;

BORON COMPOUNDS;

EID: 0026930713     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.31.3455     Document Type: Article

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