Preparation of pb(Zr, ti)04 films on si substrate by laser ablation

Japanese Journal of Applied Physics

Volumn 31, Issue 9S, 1992, Pages 2965-2967

  Kidoh, Hideo ^a   Ogawa, Toshio ^a   Yashima, Hideyuki ^b   Morimoto, Akiharu ^b   Shimizu, Tatsuo ^b  

^a Mur at a Manufacturing Co Ltd ^*  (Japan)

^b KANAZAWA UNIVERSITY   (Japan)

Author keywords

Film thickness dependence; Laser ablation; Ni alloy electrode; Pzt; Remanent polarization; Si substrate

Indexed keywords

ABLATION; LASER APPLICATIONS; LEAD COMPOUNDS; SEMICONDUCTING SILICON; SUBSTRATES; THIN FILMS;

FERROELECTRIC PEROVSKITES; LEAD ZIRCONATE TITANATE;

FERROELECTRIC MATERIALS;

EID: 0026928191     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.31.2965     Document Type: Article

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