Dependence of Surface Microroughness of Cz, Fz and Epi Wafers on Wet Chemical Processing

Journal of the Electrochemical Society

Volumn 139, Issue 8, 1992, Pages 2133-2142

  Miyashita, M ^a   Tusga, T ^a   Makihara, K ^a   Ohmi, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CLEANING; OXIDATION; ROUGHNESS MEASUREMENT; SURFACE TREATMENT;

SILICON WAFERS; SURFACE MICROROUGHNESS; WET CHEMICAL PROCESSING;

SEMICONDUCTING SILICON;

EID: 0026909660     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2221191     Document Type: Article

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