![]() |
Volumn 32, Issue 2, 1992, Pages 107-133
|
Epitaxial CoSi2 and NiSi2 thin films
|
Author keywords
[No Author keywords available]
|
Indexed keywords
COBALT COMPOUNDS;
CRYSTAL ATOMIC STRUCTURE;
EPITAXIAL GROWTH;
FABRICATION;
INTERFACES (MATERIALS);
NICKEL COMPOUNDS;
SCHOTTKY BARRIER DIODES;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DEVICE STRUCTURES;
SEMICONDUCTOR METAL BOUNDARIES;
THIN FILMS;
COBALT SILICIDE;
METAL/SEMICONDUCTOR INTERFACES;
NICKEL SILICIDE;
SEMICONDUCTOR MATERIALS;
|
EID: 0026908987
PISSN: 02540584
EISSN: None
Source Type: Journal
DOI: 10.1016/0254-0584(92)90268-D Document Type: Review |
Times cited : (109)
|
References (207)
|