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Volumn 39, Issue 4, 1992, Pages 577-583

Fast Neutron Radiation Effects in Silicon Detectors Fabricated by Different Thermal Oxidation Processes

Author keywords

[No Author keywords available]

Indexed keywords

MOS DEVICES; NEUTRONS; RADIATION EFFECTS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICES;

EID: 0026904011     PISSN: 00189499     EISSN: 15581578     Source Type: Journal    
DOI: 10.1109/23.159668     Document Type: Article
Times cited : (17)

References (13)
  • 1
    • 0024702529 scopus 로고
    • Fast Neutron Damage in Silicon Detectors
    • H. W. Kraner, Z. Li, and K. V. Posnecker, “Fast Neutron Damage in Silicon Detectors,” Nucl. Instrum. Methods A279, 266–271, (1989).
    • (1989) Nucl. Instrum. Methods , vol.A279 , pp. 266-271
    • Kraner, H.W.1    Li, Z.2    Posnecker, K.V.3
  • 4
    • 48549109349 scopus 로고
    • Radiation Damage in Silicon Detectors
    • H. W. Kraner, “Radiation Damage in Silicon Detectors,” Nucl. Instrum. Methods 225, 615–618, (1984).
    • (1984) Nucl. Instrum. Methods , vol.225 , pp. 615-618
    • Kraner, H.W.1
  • 5
    • 0026137033 scopus 로고
    • Studies of Frequency Dependent C-V Characteristics of Neutron Irradiated P+-n Silicon Detectors
    • presented at the 1990 Arlington, VA, October 23 – 27
    • Z. Li and H. W. Kraner, “Studies of Frequency Dependent C-V Characteristics of Neutron Irradiated P + -n Silicon Detectors,” presented at the 1990 IEEE Nuclear Science Symposium, Arlington, VA, October 23–27, IEEE Trans. Nucl. Sci. 38 (2), 244–250 (1991).
    • (1991) IEEE Nuclear Science Symposium IEEE Trans. Nucl. Sci. , vol.38 , Issue.2 , pp. 244-250
    • Li, Z.1    Kraner, H.W.2
  • 6
    • 30244560345 scopus 로고
    • Fast Neutron Damage of Silicon PIN Photodiodes
    • W. Dabrowsld, K. Korbel, and A. Skodzen, “Fast Neutron Damage of Silicon PIN Photodiodes,” Nucl. Instrum. Methods A301, 288–294 (1991).
    • (1991) Nucl. Instrum. Methods , vol.A301 , pp. 288-294
    • Dabrowsld, W.1    Korbel, K.2    Skodzen, A.3
  • 8
    • 84914056518 scopus 로고
    • Radiation Effects in Si Detectors and Calorimeter Considerations
    • Batavia, IL, Oct. 29 - Nov. 1eds. D. F. Anderson, M. Derrick, H. E. Fisk, A. Para, and C. M. Sazama (World Scientific, Singapore)
    • G. Lindström, M. Benkert, E. Fretwurst, T. Schulz and R. Wunstorf, “Radiation Effects in Si Detectors and Calorimeter Considerations,” Proc. of the International Conference on Calorimetry in High Energy Physics, Fermi Laboratory, Batavia, IL, Oct. 29 - Nov. 1, 1990, eds. D. F. Anderson, M. Derrick, H. E. Fisk, A. Para, and C. M. Sazama (World Scientific, Singapore), 467–476 (1991).
    • (1990) Proc. of the International Conference on Calorimetry in High Energy Physics, Fermi Laboratory , pp. 467-476
    • Lindström, G.1    Benkert, M.2    Fretwurst, E.3    Schulz, T.4    Wunstorf, R.5
  • 9
    • 84939339864 scopus 로고    scopus 로고
    • Measurements of Possible Type Inversion in Silicon Junction Detectors by Fast Neutron Irradiation
    • BNL-46210, September
    • Zheng Li and H. W. Kraner, “Measurements of Possible Type Inversion in Silicon Junction Detectors by Fast Neutron Irradiation,” BNL-46210, September 1991.
    • Li, Z.1    Kraner, H.W.2
  • 10
    • 0020169807 scopus 로고
    • Defect Production and Lifetime Control in Electron and γ-irradiated Silicon
    • S. D. Brotherton and P. Bradley, “Defect Production and Lifetime Control in Electron and γ-irradiated Silicon,” J. Appl. Phys. 53 (8), 5720 (1982).
    • (1982) J. Appl. Phys , vol.53 , Issue.8
    • Brotherton, S.D.1    Bradley, P.2
  • 11
    • 0003610719 scopus 로고    scopus 로고
    • MOS (Metal Oxide Semiconductor) Physics and Technology
    • John Wiley & Sons, New York
    • E. H. Nicollian and J. R. Brews, “MOS (Metal Oxide Semiconductor) Physics and Technology,” (John Wiley & Sons, New York), 144 (1982).
    • , vol.144
    • Nicollian, E.H.1    Brews, J.R.2
  • 12
    • 84939397336 scopus 로고    scopus 로고
    • private communication
    • G. Hall, private communication, 1991.
    • Hall, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.