Passivation of Permalloy Thin Films: II. In Situ Characterization of the Oxide Layer by Photoelectrochemical and Impedance Measurements

Journal of the Electrochemical Society

Volumn 139, Issue 7, 1992, Pages 1855-1862

  Dagan, Geula ^a   Shen, Wu Mian ^a   Tomkiewicz, Micha ^a  

^a CITY UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; ELECTRIC IMPEDANCE; ELECTROCHEMISTRY; IRON; MATHEMATICAL MODELS; NICKEL; NICKEL ALLOYS; OXIDES; PHOTOCHEMICAL REACTIONS; THIN FILMS;

MOTT-SCHOTTKY PLOTS; PERMALLOY; PHOTOELECTROCHEMISTRY;

PASSIVATION;

EID: 0026899476     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2069511     Document Type: Article

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