Anisotropic etching of silicon in TMAH solutions

Sensors and Actuators: A. Physical

Volumn 34, Issue 1, 1992, Pages 51-57

  Tabata, Osamu ^a   Asahi, Ryouji ^a   Funabashi, Hirofumi ^a   Shimaoka, Keiichi ^a   Sugiyama, Susumu ^a  

^a Rd Management Section   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS - SOLUTIONS; CRYSTALS - ORIENTATION;

ANISOTROPIC ETCHING; TETRAMETHYL AMMONIUM HYDROXIDE;

SEMICONDUCTING SILICON;

EID: 0026898739     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/0924-4247(92)80139-T     Document Type: Article

References (16)

1. Tactile image detection using a 1k-element silicon pressure sensor array
2. An infrared detector using poly-silicon p—n junction diode
3. Semiconductor Silicon
4. Detection of discontinuities in passivating layers on silicon by NaOH anisotropic etch
5. Cesium hydroxide [CsOH] a useful etchant for micromachining silicon
6. 4OH-based etchants for silicon micromachining
7. The controlled etching of silicon in catalyzed ethylenediamine—pyrocatechol—water solutions
8. Optimization of the hydrazine—water solution for anisotropic etching of silicon in integrated circuit technology
9. Application of choline in semiconductor technology
10. 4OH-based etchants for silicon micromachining: influence of additives and stability of passivation layers
11. Anisotropic etching of silicon with quarternary ammonium hydroxide solutions
12. On etching very narrow grooves in silicon
13. Anisotropic etching of crystalline silicon in alkaline solutions I Orientation dependence and behavior of passivation layers
14. 4NOH solutions
15. TMAHW etchants for silicon micromachining
16. Etching stop technique of polysilicon