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Volumn 13, Issue 5, 1992, Pages 259-261

73-GHz Self-Aligned SiGe-Base Bipolar Transistors with Phosphorus-Doped Polysilicon Emitters

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUITS, DIGITAL - MICROWAVES; SEMICONDUCTING SILICON - DOPING; SILICON GERMANIUM ALLOYS;

EID: 0026869745     PISSN: 07413106     EISSN: 15580563     Source Type: Journal    
DOI: 10.1109/55.145046     Document Type: Article
Times cited : (51)

References (12)
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  • 2
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  • 3
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    • Comfort, J.H.1
  • 4
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    • Comparison of experimental and computed results on arsenic- and phosphorus-doped polysilicon emitter bipolar transistors
    • P. Ashburn, D. J. Roulston, and C. R. Selvakumar, “Comparison of experimental and computed results on arsenic- and phosphorus-doped polysilicon emitter bipolar transistors,” IEEE Trans. Electron Devices, vol. ED-34, pp. 1346–1353, 1987.
    • (1987) IEEE Trans. Electron Devices , vol.ED-34 , pp. 1346-1353
    • Ashburn, P.1    Roulston, D.J.2    Selvakumar, C.R.3
  • 5
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    • Poly emitter bipolar transistor optimization for an advanced BICMOS technology
    • B. Landau et al., “Poly emitter bipolar transistor optimization for an advanced BICMOS technology,” in Proc. Bipolar Circuits and Technology Meeting, 1988, pp. 117-120.
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    • Landau, B.1
  • 6
    • 0026400173 scopus 로고    scopus 로고
    • An ultrahigh emitter efficiency transistor with a low-temperature processed polysilicon emitter for high-speed bipolar ULSIs
    • M. Kondo, M. Namba, T. Kobayashi, S. Iijima, and T. Nakamura, “An ultrahigh emitter efficiency transistor with a low-temperature processed polysilicon emitter for high-speed bipolar ULSIs,” in 1991 Symp. VLSI Technol. Dig., pp. 65-66.
    • 1991 Symp. VLSI Technol. Dig. , pp. 65-66
    • Kondo, M.1    Namba, M.2    Kobayashi, T.3    Iijima, S.4    Nakamura, T.5
  • 7
    • 5844399719 scopus 로고
    • Low-temperature silicon epitaxy by ultrahigh vacuum/chemical vapor deposition
    • B. S. Meyerson, “Low-temperature silicon epitaxy by ultrahigh vacuum/chemical vapor deposition,” Appl. Phys. Lett. vol. 48, pp. 797–799, 1986.
    • (1986) Appl. Phys. Lett. , vol.48 , pp. 797-799
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  • 8
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  • 10
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.